Program · ASD 2027 · Area Selective Deposition Workshop

Robert D. Clark

Director of TEL U.S. R&D Strategic Partnerships, Tokyo Electron US, USA

“Area selective deposition integration and applications”

Mikko Ritala

Professor, Department of Chemistry, University of Helsinki, Finland

“Methods for in situ and in vacuo characterization of ALD and ASD processes”

Adriaan J.M. Mackus

Associate Professor, Plasma and Materials Processing, Applied Physics Department, Eindhoven University of Technology, Netherlands

“From Inhibition to Selectivity: Mechanistic Insights into Area-Selective ALD”

Christophe Vallée

Professor, College of Nanotechnology, Science, and Engineering, Department of Nanoscale Science & Engineering, University at Albany, USA

“Area selective deposition by Plasma-Enhanced Chemical Vapor Deposition”

Anjana Devi

Director of the Institute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, Germany

“Ligand Design and Reactivity Tuning: Tailoring Precursors for Area-Selective Deposition”

Angel Yanguas-Gil

Director, Argonne Microelectronics Institute, Argonne National Laboratory, USA

“How to build AI agents for autonomous atomic scale processing and selective growth”

Ainhoa Romo Negreira

Principal Engineer thin films, Tokyo Electron Europe

“Controlling surface activation through inhibitor and surface preparation for Area-Selective Deposition Integration”

Ron Pearlstein

Executive Director, EMD Electronics, USA

“Solving challenges in ASD from process design through high volume manufacturing”